Genus (NASDAQ:GGNS)
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Genus Lands First ALD Customer in Taiwan
Major Foundry to Adopt ALD for Advanced DRAM Production
SUNNYVALE, Calif., April 1 /PRNewswire-FirstCall/ -- Genus, Inc. today
announced that it received a purchase order for its StrataGem atomic layer
deposition (ALD) system from one of the world's largest semiconductor foundries
in Taiwan. This marks the first insertion of Genus' ALD tools into Taiwan. The
system will be used for the production of advanced DRAMs of 110 nm, 90 nm, 70nm
and below. Genus' StrataGem system was selected because it delivers the best in
class process capabilities, smallest footprint and production reliability
necessary for the manufacturing of leading-edge devices.
The Genus StrataGem product offers alarge number of film processes for use in
advanced semiconductor devices including DRAMs, Flash, EDRAMs, ASICs, logic and
thin film heads. The key features of the StrataGem system is its patented
chamber and ALD gas delivery system design. Today, DRAM capacitors are a main
driver of ALD into volume manufacturing in semiconductors, and this order marks
the third DRAM manufacturer to use Genus' ALD systems in volume production
lines.
"ALD has been named the technology of choice for DRAM capacitors, and Taiwan has
been a key target growth area for Genus," states Bill Elder, chairman and CEO of
Genus. "This order signals the further adoption of ALD use in mass production of
advanced semiconductor devices, and we are pleased to add this key major
Taiwanese customer to the growing list of ALD adopters worldwide."
"Genus has already increased its support and logistics capabilities in Taiwan as
we continue our expansion into the region," said John Voltz, vice president of
sales and marketing for Genus. "This first purchase of our advanced StrataGem
system validates our customer's confidence in our ability to deliver high
quality, production worthy processes to meet their most advanced technology
requirements."
About Genus:
Genus, Inc. manufactures critical deposition processing products for the global
semiconductor industry and the data storage industry. To enable the production
of intricate micro computer chips and electronic storage devices, Genus offers
its StrataGem and LYNX series production-proven equipment for 200mm and 300mm
semiconductor production, and offers thin film deposition products for chemical
vapor deposition (CVD), atomic layer deposition (ALD), and pre-clean
capabilities. Genus is at the forefront of market and technology developments
in the ALD marketplace, which is gaining acceptance worldwide as a critical
technology for sub 0.13-micron production of computer chips and electronic
storage devices. Genus' customers include semiconductor and data storage
manufacturers located throughout the United States, Europe and the Pacific Rim
including Korea, Japan and Taiwan. Founded in 1981, the company is headquartered
in Sunnyvale, California. For additional information visit Genus' web site at
http://www.genus.com/. LYNX2(R) and LYNX3(TM) are trademarks of Genus, Inc.
DATASOURCE: Genus, Inc
CONTACT: Trine Pierik of Positio Public Relations, Inc., +1-408-453-2400
or , for Genus, Inc.; or Shum Mukherjee of Genus, Inc.,
+1-408-747-7140 or
Web site: http://www.genus.com/