Genus (NASDAQ:GGNS)
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Genus Advances ALD to 45 nm Technology Node and Beyond in Most Advanced
University R&D Facility in the World
Albany NanoTech Orders 300 mm Wafer ALD Systems for Advanced Dielectric and EUV
Programs
SUNNYVALE, Calif., Oct. 27 /PRNewswire-FirstCall/ -- Genus, Inc. , a leader in
advanced thin film deposition equipment used to manufacture semiconductor and
data storage devices, today announced orders for two atomic layer deposition
(ALD) systems from Albany NanoTech (ANT) of the University at Albany-SUNY
(UAlbany) for its 45 nm research and development (R&D) activities. The systems
will be located at ANT's NanoFab 300 complex, the most advanced 300 mm wafer R&D
facility at any university in the world. Albany has earmarked a Genus
StrataGem300 bridge tool for its advanced dielectric research program and a
StrataGem200 for use in its extreme ultraviolet (EUV) lithography program.
Genus' Stratagem 200 and 300 mm systems span three generations of manufacturing,
providing unique extendibility and flexibility benefits for customers worldwide.
The tools' multi-film capability and extendibility from 130 nm down to 45 nm
provide Albany with key benefits for use in an advanced R&D environment.
"We are delighted to be selected by Albany NanoTech for both its advanced high-k
dielectric and lithography EUV programs," said Bill Elder chairman and CEO of
Genus, Inc. "It is a significant milestone in Genus' ALD program to be accepted
at the most notable and best-funded university program in the United States."
"The selection of the Genus StrataGem300 tool platforms is a critical enabling
step in our strategic plan to establish a center of excellence in atomic layer
deposition to address our high-end device fabrication and integration needs,"
stated Alain E. Kaloyeros, Ph.D., executive director of ANT and founding Dean of
the School. "We are extremely excited by our partnership with Genus, given its
recognition as world's leading supplier of ALD equipment. The StrataGem300
platforms will significantly strengthen our research, educational, and workforce
training programs, not to mention the ability to better serve key sectors of our
industrial customer base."
About Albany NanoTech
Albany NanoTech at UAlbany as the umbrella organization that oversees and
coordinates UAlbany's comprehensive portfolio of research, education, and
outreach programs in nanosciences, nanoengineering, and nanotechnology. It
serves as a fully-integrated research, development, prototyping, and technology
deployment resource that manages a strategic portfolio of focus centers that
encompass nanoelectronics, system-on-a-chip technologies, biochips,
optoelectronics and photonics devices, closed-loop sensors for monitoring,
detection, and protection, and ultra-high-speed communication components.
Albany NanoTech is housed in new 425,000 sq. ft. complex, including the only
200mm/300mm wafer facilities in the academic world. By mid 2004, Albany
NanoTech assets will exceed $1.0B in state-of-the-art equipment and tools,
housed within 60,000 sq. ft. of Class 1 capable 300mm wafer cleanrooms. These
assets are dedicated to providing company partners with a unique environment to
pioneer, develop, and test new ideas within a technically aggressive and
financially competitive R&D environment.
About Genus
Genus, Inc. manufactures critical deposition processing products for the global
semiconductor industry and the data storage industry. To enable the production
of intricate micro-computer chips and electronic storage devices, Genus offers
its LYNX and StrataGem series of production-proven equipment for 200 mm and 300
mm semiconductor production, and offers thin film deposition products for
chemical vapor deposition (CVD), atomic layer deposition (ALD), and pre-clean
capabilities. Genus is at the forefront of market and technology developments in
the ALD marketplace, which is gaining acceptance worldwide as a critical
technology for sub-0.13-micron production of computer chips and electronic
storage devices. Genus' customers include semiconductor manufacturers located
throughout the United States, Europe and the Pacific Rim including Korea, Japan
and Taiwan. Founded in 1981, the company is headquartered in Sunnyvale,
California. For additional information visit Genus' web site at
http://www.genus.com/.
NOTE: LYNX2(R), and LYNX3(TM) are trademarks of Genus, Inc.
Forward-Looking Statements
This press release contains forward-looking statements regarding the company's
future financial and business performance. These forward-looking statements are
subject to a number of risks and uncertainties. These contingencies include but
are not limited to: actual customer orders received by the company, the extent
to which ALD technology is demanded by the marketplace, the actual number of
customer orders received by the company, availability of components from
suppliers, the timing of final acceptance of products by customers, the
financial climate, accessibility to financing and fulfillment of closing
conditions, general conditions in the thin film equipment market and in the
macro-economy, and the influence of global political events. Genus assumes no
obligation to update this information. Additional risks and uncertainties are
discussed in the Management's Discussion and Analysis of Results of Operations
contained in Genus' Annual Report on Form 10-K for the fiscal year ended
December 31, 2001 and subsequent quarterly reports on Form 10-Q filed with the
Securities and Exchange Commission.
DATASOURCE: Genus, Inc.
CONTACT: Trine Pierik of Positio Public Relations, Inc.,
+1-650-815-1006, or , for Genus; or Irene Dunlop of Genus,
Inc., +1-408-747-7140, ext. 1140; or Alain E. Kaloyeros, Ph.D., of Albany
NanoTech, +1-518-442 4533, or
Web site: http://www.genus.com/